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Application of Inclined and Rotating UV Lithography in Preparation of Microneedles
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JIANG Hongmin,ZHU Jun,CAO Ying,CHEN Xiang,CHEN Di
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（Institute of Micro/Nano Science and Technology, National Key Laboratory of Nano/Micro Fabrication Technology， Key Laboratory for Thin Film and Microfabrication of the Ministry of Education, Shanghai Jiaotong University，Shanghai 200030, China）
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Abstract By improving the existing equipment of our laboratory, the process of inclined and rotating UV lithography in the fabrication of conical outofplane microneedles was researched and conical outofplane microneedles of PDMS were produced through pattern transfer between polymer materials by the SU8 photoresist mold. This method has the advantages of low cost and wide material applicability. The microneedle with the inclination of 67 °and the height of 353 microns was made by this method.
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Received: 21 August 2009
Published: 31 August 2010
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