An nmlevel positioning precision and high-speed were required by using macro movement of long stroke linear motor and high-precision micro movement of planar motor in the wafer stage of lithography. In order to reduce the movement scope and acceleration of planar motor, the tracking precision of linear motor must be improved. Therefore, this paper presented a combined repetitive control strategy based on the combination of zero phase error tracking-feed-forward (ZPETFF) controller and the disturbance observer (ESO). The ZPET-FF was used as the feed-forward controller, which used the real-time compensation of the controller according to the tracking error of the system, so that the influence of parametric variation of the system and the dynamic tracking error of the system could be reduced, while ESO reduced the influences of the uncertainties, suppressed the system noise and improved the antiinterference ability of the system effectively. The experiment shows that the proposed control method not only improves the dynamic tracking performance of the system, but also reduces the tracking error of the system.