Standard CMOS processes enable the formation of multiple pn-junctions along the depth direction using the triple-well process. Horiguchi proposed an element-separated on-chip PV cell by using triple-well CMOS process
14. The light-induced carriers can affect the subthreshold voltage of the transistor and make its operations unstable; triple-well layer works as a barrier against these carriers. Here, the triple-well process results in the formation of multiple pn-junctions along the vertical direction; therefore, a few designs will cut off all carriers generated at the substrate and the large efficiency drops. Steffan
et. al. reported the structural designs, including the shape and layer designs of on-chip PV cells
15. When only surface-generated carriers were collected, only less than 10% output power was available from the full region scheme. When applying the surface passivation, the output power could be enhanced by approximately 10%, and the patch shape was better than the bar shape. The performances were also influenced by the surface design from both the electrical (passivation) and optical (anti-reflection) aspects. Enhancing the conversion efficiency by forming an anti-reflection (AR) coating at the front-side was also reported
16. Two types of AR coats (Al only and Al/Mg stack) were evaluated, and the performances were significantly enhanced by forming an Al/Mg layer stack as an AR coating, and the conversion efficiency reached as high as 12.8%. For standard CMOS processes, light illumination is not estimated, and AR coat forming will need post-processing. Hung et al. proposed a contact-shading-free PV cell by adopting the reversed LSI chips
17. Electrical contacts were the sources of potential power loss for PV cells by shading illuminations, and the general CMOS processes formed all the contacts at the front-surface; therefore, shading loss could be avoided by reversing the LSI chips. The reversed light absorption properties should be taken into careful consieration for this type of cell : the shorter wavelength will be absorbed at the bottom surface (near the illuminated surface), and the longer wavelength light will reach the pn-junction. The reported cell efficiency is still limited to 4.6%, and further improvement is highly desired.