|
|
|
| Research on Dual-band Infrared Image Generation Technology Based on Dual MOS Resistor Array |
| CHEN Haiyan, ZHAO Songqing, WU Genshui, HAO Yanyun, LI Rui, ZHANG Fan |
1. China Airborne Missile Academy, Luoyang 471009, Henan, China;
2. Aviation Key Laboratory of Science and Technology on Airborne Guided Weapons, Luoyang 471009, Henan, China |
|
|
|
Abstract Aiming at the problem of image generation in hardwareintheloop simulation of infrared dualband guidance system, the technology of dual-band infrared image generation was studied.The research status of dual-band infrared image generation system at home and abroad was briefly introduced, and the principle and the mode of dual-band infrared image generation system were analyzed. A scheme of dual-band infrared image generation system based on the MOS resistor array was designed. The calibration method of dual-band radiation characteristic for MOS resistor array and the pixel alignment method of dual resistor array were explained. Finally, the structural design result of dual-band IR image generation system, transmittance curve of beam combiner, and the alignment result of image element were given, and the calculation result of dual-band radiation luminance was also provided.
|
|
Received: 14 August 2020
Published: 29 December 2020
|
|
|
|
|
|
|
2020, Vol. 3 
